Defect-Free Ultra-Shallow Source/Drain Extension Using Spin-on-Dopants for Deep Submicron SOI MOSFET Applications

Journal of the Korean Physical Society

Volumn 44, Issue 2, 2004, Pages 423-426

  Yang, Jong Heon ^a   Oh, Jihun ^a   Cho, Won Ju ^a   Lee, Seongjae ^a   Im, Kiju ^b   Park, Kyoungwan ^c  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c University of Seoul   (South Korea)

Author keywords

Crystal defect; MOSFET; PLAD; Plasma doping; Short channel effect; SIMS; SOD; SOI; Solid phase diffusion; Source drain extension; SPD; Spin on dopants; TEM; Ultra shallow junction; USJ

Indexed keywords

EID: 1542381002     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. C. M. Osburn, I. De, K. F. Yee and A. Srivastava, J. Vac. Sci. Technol. B 18, 338 (2000).
2. C. R. Cleavelin, Billy C. Covington and Lawrence A. Larson, J. Vac. Sci. Technol. B 18, 346 (2000).
3. Jeong-Won Kang and Ho-Jung Hwang, J. Korean Phys. Soc. 34, 477 (1999).
4. P. K. Chu, S. Qin, C. Chan, N. W. Cheung and L. A. Larson, Mat. Sci. Eng. R 17, 207 (1996).
5. B. P. Linder and N. W. Cheung, IEEE Trans. Plasma Sci. 24, 1383 (1996).
6. B. Mizuno, I. Nakayama, N. Aoi, M. Kubota and T. Komeda, Appl. Phys. Lett. 53, 2059 (1988).
7. S. Qin, N. E. MCGruer, C. Chan and K. Warner, IEEE Trans. Elec. Dev. 29, 2354 (1992).
8. M. Takase, K. Yamashita, A. Hori and B. Mizuno, IEDM Technical Digest, 475 (1997).
9. S. Maeng, T. Kang, W. Cho, M. Jang, S. Lee, K. Park and K. Im, J. Korean Phys. Soc. 42, 666 (2003).
10. K. J. Kramer, S. Talwar, A. M. MCCarthy and K. H. Weiner, IEEE Elec. Dev. Lett. 17, 461 (1996).
11. K. H. Weiner, P. G. Carey, A. M. MCCarthy and T. W. Sigmon, IEEE Elec. Dev. Lett. 13, 369 (1992).
12. P. G. Carey, K. H. Weiner and T. W. Sigmon, IEEE Trans. Elec. Dev. 35, 2429 (1988).
13. A. Usami, M. Ando, M. Tsunekane and T. Wada, IEEE Trans. Elec. Dev. 39, 105 (1992).
14. K. Im, H. Hwang, W. Cho, S. Lee and K. Park, J. Korean Phys. Soc. 42, 229 (2003).
15. International Technology Roadmap for Semiconductors 2002 update (International SEMATECH, 2002).