Formation of a shallow junction by using the spin-coating solid-phase diffusion method for sub-micron SOI MOSFETs

Journal of the Korean Physical Society

Volumn 42, Issue 2, 2003, Pages 229-232

  Im, Kiju ^a   Hwang, Hyungsang ^a   Cho, Won Ju ^b   Lee, Seongjae ^b   Park, Kyoungwan ^b  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

MOSFET; PSG; Shallow junction; SOI; SPD

Indexed keywords

EID: 0037295921     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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