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Volumn 769, Issue , 2003, Pages 35-40

Ultra-Low Temperature Poly-Si Thin Film by Excimer Laser Recrystallization For Flexible Substrates

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; INDUCTIVELY COUPLED PLASMA; LASER BEAM EFFECTS; LOW TEMPERATURE EFFECTS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

EID: 1542364456     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-769-h2.3     Document Type: Conference Paper
Times cited : (1)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.