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Volumn 769, Issue , 2003, Pages 35-40
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Ultra-Low Temperature Poly-Si Thin Film by Excimer Laser Recrystallization For Flexible Substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
CRYSTALLIZATION;
EXCIMER LASERS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HYDROGENATION;
INDUCTIVELY COUPLED PLASMA;
LASER BEAM EFFECTS;
LOW TEMPERATURE EFFECTS;
POLYCRYSTALLINE MATERIALS;
SCANNING ELECTRON MICROSCOPY;
THIN FILMS;
PHYSICAL SPUTTERING;
PRECURSOR FILMS;
POLYSILICON;
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EID: 1542364456
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-769-h2.3 Document Type: Conference Paper |
Times cited : (1)
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References (7)
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