Site specific 2-D implant profiling using FIB assisted SCM

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2002, Pages 467-471

  Jarausch, Konrad ^a   Richards, John F ^a   Denney, Lloyd ^a   Guichard, Alex ^b   Russell, Phillip E ^b  

^a INTEL CORPORATION   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSED ION BEAM (FIB); SCANNING CAPACITANCE MICROSCOPY (SCM);

AMORPHIZATION; COMPUTER SOFTWARE; ION IMPLANTATION; POLISHING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAMS;

EID: 1542360084     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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9. FEI 830, FEI Corporation, Hillsboro OR.
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