Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: A comparison

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 264-269

  Bedoya, C ^a   Condorelli, G G ^a   Di Mauro, A ^a   Anastasi, G ^a   Fragala I L ^a   Lisoni, J G ^b   Wouters, D ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b IMEC   (Belgium)

Author keywords

Fluorine; MOCVD; Strontium; Diketonates

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; FLUORINE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBLIMATION; THERMODYNAMIC STABILITY; X RAY ANALYSIS;

ELECTRONIC OXIDES; MASS TRANSPORT PROCESSES; MOCVD PRECURSORS; Β-DIKETONATES;

OXIDES;

EID: 15344351554     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.045     Document Type: Conference Paper

References (26)

1. Y. Gao, C.L. Perkins, S. He, P. Alluri, T. Tran, S. Thevuthasan, and M.A. Henderson J. Appl. Phys. 87 2000 7430
2. T. Nakamura, and K. Tachibana Jpn. J. Appl. Phys. 40 2001 338
3. M. Yamamuka, S. Momose, T. Nakamura, K. Tachibana, and H. Takada Jpn. J. Appl. Phys. 41 2002 2231
4. S. Momose, T. Nakamura, and K. Tachibana Jpn. J. Appl. Phys. 39 2000 5384
5. F. Weiss, J. Lindner, J.P. Senateur, C. Dubourdieu, V. Galindo, M. Audier, A. Abrutis, M. Rosina, K. Frohlich, W. Haessler, S. Oswald, A. Figueras, and Santiso J. Surf. Coat. Technol. 133-134 2000 191
6. T. Kimora, H. Yamauchi, H. Machida, H. Kokubun, and M. Yamada Jpn. J. Appl. Phys. 33 1994 5119
7. C.A. Araujo, J.D. Cuchiaro, L.D. McMillan, M.C. Scott, and J.F. Scott Nature 374 1989 627
8. L.H. Parker, and A.F. Tasch IEEE Circuit Devic. Magn. 6 1990 17
9. R. Ramesh, S. Aggarwal, and O. Auciello Mater. Sci. Eng. R. Rep. 32 2001 191
10. R. Zambrano Mater. Sci. Semiconduct. Process. 5 2002 305
11. A.C. Jones, and P.R. Chalker J. Phys. D: Appl. Phys. 36 2003 80
12. R. Gardiner, D.W. Brown, P.S. Kirlin, and A.L. Rheingold Chem. Mater. 3 1991 1053
13. S.R. Drake, S.A.S. Miller, M.B. Hursthouse, and K.M.A. Malik Polyhedron 12 1993 1621
14. G. Malandrino, F. Castelli, and I.L. Fragala Inorg. Chim. Acta 224 1994 203
15. G.G. Condorelli, S. Gennaro, and I.L. Fragalà Chem. Vapor Depos. 6 2000 185
16. J.W. Park, J.T. Kim, S.M. Koo, C.G. Kim, and Y.S. Kim Polyhedron 19 2000 2547
17. J. Brooks, H.O. Davies, T.J. Leedham, A.C. Jones, and A. Steiner Chem. Vapor Depos. 6 2000 66
18. N.B. Colthup, L.H. Daly, and S.E. Wiberley Introduction to Infrared and Raman Spectroscopy 1964 Academic Press New York p. 220
19. K. Nakamoto Infrared and Raman Spectra of Inorganic and Coordination Compounds 1978 Wiley New York
20. G.G. Condorelli, A. Baeri, and I.L. Fragalà Chem. Mater. 14 2002 4307
21. Joint Committee Pattern Diffraction Society, JCPDS card No. 05-418.
22. D.S. Kil, J.M. Lee, and J.S. Roh Chem. Vapor Depos. 8 2002 195
23. H. Van doveren, and J.A.T. Verhoeven J. Electr. Spectrosc. Related Phenom. 21 1980 265
24. R.P. Vasquez J. Electr. Spectrosc. Related Phenom. 56 1991 217
25. M.I. Sosulnikiv, and Y.A. Teterin J. Electr. Spectrosc. Related Phenom. 59 1992 111
26. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben J. Charstain Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corporation, Physical Electronic Division Eden Praire, MN