A liftoff technique for molecular nanopatterning

Journal of Nanoscience and Nanotechnology

Volumn 3, Issue 4, 2003, Pages 309-312

  Hang, Qingling ^a   Wang, Yuliang ^b   Lieberman, Marya ^b   Bernstein, Gary H ^a  

^a University of Notre Dame   (United States)

^b UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

Atomic Force Microscopy; Electron Beam Lithography; Molecular Electronics; PMMA; QCA

Indexed keywords

POLY(METHYL METHACRYLATE); SILICON DIOXIDE;

ADSORPTION; AQUEOUS SOLUTION; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CONFERENCE PAPER; CONFORMATION; CRYSTALLIZATION; ELECTRON; ELECTRON BEAM; FILM; INSTRUMENTATION; METHODOLOGY; MOLECULAR COMPUTER; MOLECULAR DYNAMICS; NANOTECHNOLOGY; PHOTOGRAPHY; QUANTUM DOT; SURFACE PROPERTY;

ADSORPTION; COMPUTERS, MOLECULAR; CRYSTALLIZATION; ELECTRONS; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; MOLECULAR CONFORMATION; NANOTECHNOLOGY; PHOTOGRAPHY; POLYMETHYL METHACRYLATE; QUANTUM DOTS; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 2342494845     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2003.183     Document Type: Conference Paper

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