Adsorbed layer etching of fused silica by excimer laser with nanometer depth precision

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 324-330

  Zimmer, K ^a   Bohme R ^a   Rauschenbach, B ^a  

^a Leibniz Inst O   (Germany)

Author keywords

Excimer laser; Fused silica; Laser etching; LESAL

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; ETCHING; EXCIMER LASERS; FLUIDICS; LASER ABLATION; LASER BEAM EFFECTS; MICROOPTICS; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY; PRECISION ENGINEERING; TOLUENE;

LESAL; MASK PROJECTION TECHNIQUES; NANOMETERS; THERMO ELASTIC STRESSES;

FUSED SILICA;

EID: 14944350443     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.042     Document Type: Conference Paper

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