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Volumn 49, Issue 5, 2005, Pages 795-801

Empirical model of data retention degradation in stacked-gate flash EEPROM cells with new interpoly dielectric of an Oxide-Nitride-Oxide-Nitride (ONON) layer

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DATA STORAGE EQUIPMENT; DIELECTRIC MATERIALS; GATES (TRANSISTOR); MATHEMATICAL MODELS; NITRIDES; THRESHOLD VOLTAGE;

EID: 14844334211     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2005.01.023     Document Type: Conference Paper
Times cited : (4)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.