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Volumn 49, Issue 5, 2005, Pages 795-801
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Empirical model of data retention degradation in stacked-gate flash EEPROM cells with new interpoly dielectric of an Oxide-Nitride-Oxide-Nitride (ONON) layer
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
DATA STORAGE EQUIPMENT;
DIELECTRIC MATERIALS;
GATES (TRANSISTOR);
MATHEMATICAL MODELS;
NITRIDES;
THRESHOLD VOLTAGE;
DATA RETENTION;
EMPIRICAL MODELS;
THERMOIONIC EMISSIONS;
VOLTAGE SHIFT RATE;
MOS DEVICES;
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EID: 14844334211
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/j.sse.2005.01.023 Document Type: Conference Paper |
Times cited : (4)
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References (17)
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