Combined study of X-ray reflectivity and atomic force microscopy on a surface-grafted phospholipid monolayer on a solid

Journal of Colloid and Interface Science

Volumn 284, Issue 1, 2005, Pages 107-113

  Kim, Kwangmeyung ^a   Byun, Youngro ^a   Kim, Chulhee ^b   Kim, Tae Chul ^a   Noh, Do Young ^a   Shin, Kwanwoo ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Inha University   (South Korea)

Author keywords

Atomic force microscopy; In situ polymerization; Phospholipid monolayer; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; MOLECULAR STRUCTURE; MONOLAYERS; POLYMERIZATION; REFLECTION; X RAY ANALYSIS;

SURFACE-GRAFTED PHOSPHOLIPIDS; X-RAY REFLECTIVITY;

PHOSPHOLIPIDS;

METHACRYLIC ACID DERIVATIVE; PHOSPHOLIPID;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL BOND; CHEMICAL STRUCTURE; DATA ANALYSIS; MEASUREMENT; MOLECULE; MORPHOLOGY; POLYMERIZATION; PRIORITY JOURNAL; SOLID; X RAY ANALYSIS;

LYSOPHOSPHATIDYLCHOLINES; MEMBRANES, ARTIFICIAL; METHACRYLATES; MICROSCOPY, ATOMIC FORCE; MOLECULAR STRUCTURE; ORGANOSILICON COMPOUNDS; PHOSPHATIDYLCHOLINES; PHOSPHOLIPIDS; SILICON; X-RAY DIFFRACTION;

EID: 14744306063     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.09.068     Document Type: Article

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