Argon plasma modelling in a RF magnetron sputtering system

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 392-398

  Palmero, A ^a   van Hattum, E D ^a   Arnoldbik, W M ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Magnetron; Plasma simulation and modelling; Reactive sputtering; Silicon oxide

Indexed keywords

ARGON; CURRENT VOLTAGE CHARACTERISTICS; DATA ACQUISITION; PLASMA SHEATHS; PLASMAS; SECONDARY EMISSION; THIN FILMS;

ARGON PLASMA MODELLING; PLASMA MAGNETIZATION; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; SILICON SUB-OXIDE THIN FILMS;

MAGNETRON SPUTTERING;

PLASMA TREATMENT;

EID: 14644416575     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.032     Document Type: Article

References (14)

1. R.D. Arnell P.J. Kelly Surf. Coat. Technol. 112 1999 170
2. B. Window Surf. Coat. Technol. 81 1996 92
3. J. Musil J. Vlcek Surf. Coat. Technol. 112 1999 162
4. S. Berg T. Nyberg H.O. Blom C. Nender J. Vac. Sci. Technol., A, Vac. Surf. Films 16 3 1998 1277
5. L. Pekker Thin Solid Films 312 1998 341
6. A. Palmero N. Tomozeiu A.M. Vredenberg W.M. Arnoldbik F.H.P.M. Habraken Surf. Coat. Technol. 177-178 2004 215
7. A.E. Wendt M.A. Lieberman J. Vac. Sci. Technol., A, Vac. Surf. Films 8 2 1990 902
8. Lan Gu M.A. Lieberman J. Vac. Sci. Technol., A, Vac. Surf. Films 6 5 1988 2960
9. Kiyotaka Wasa Shigeru Hayakawa Handbook of Sputter Deposition Technology 1992 Noyes Publications 61
10. N.F. Cramer J. Phys., D. Appl. Phys. 30 1997 2573
11. L. Pekker S.I. Krasheninnikov Phys. Plasmas 7 1 2000 382
12. J.W. Bradley Plasma Sources Sci. Technol. 5 1996 622
13. A. Palmero E.D. van Hattum W.M. Arnoldbik A.M. Vredenberg F.H.P.M. Habraken J. Appl. Phys. 30 1997 2573
14. E. Gogolides H.H. Sawin J. Appl. Phys. 72 9 1992 3988