Room-temperature formation of tantalum oxide films by liquid phase deposition

Thin Solid Films

Volumn 478, Issue 1-2, 2005, Pages 332-337

  Huang, C J ^a  

^a NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

Liquid phase deposition (LPD); Silicon (Si); Tantalum pentoxide (Ta2O 5)

Indexed keywords

CAPACITORS; DEPOSITION; MOS DEVICES; PERMITTIVITY; REFRACTIVE INDEX; SILICON; TANTALUM; THERMAL EFFECTS;

GROWTH MECHANISM; LIQUID PHASE DEPOSITION (LPD); PROCESSING TEMPERATURE; TANTALUM PENTOXIDE (TA2O5);

THIN FILMS;

EID: 14544278433     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.100     Document Type: Article

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