Control of Photoresist Thickness Uniformity in the Microlithography Process

IECON Proceedings (Industrial Electronics Conference)

Volumn 3, Issue , 2003, Pages 2091-2096

  Tay, Arthur ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Photoresist Processing; Photoresist Thickness Uniformity; Semiconductor Manufacturing; Temperature Control

Indexed keywords

PHOTORESIST PROCESSING; PHOTORESIST THICKNESS UNIFORMITY; SEMICONDUCTOR MANUFACTURING;

ALGORITHMS; CONTROL EQUIPMENT; ESTIMATION; LITHOGRAPHY; SILICON WAFERS; SPECIFIC HEAT; SPIN COATING; TEMPERATURE CONTROL; TEMPERATURE DISTRIBUTION; THERMAL CONDUCTIVITY; THICKNESS CONTROL;

PHOTORESISTS;

EID: 1442310427     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IECON.2003.1280565     Document Type: Conference Paper

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