Bake mechanisms in novolak-based photoresist films: investigation by contact angle measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 460-468

  Fadda, Emilienne ^a   Clarisse, C ^a   Paniez, Patrick J ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; CHEMICAL BONDS; COATINGS; FILMS; HYDROGEN; MOLECULES; PHOTOLITHOGRAPHY; POLYMERS; THERMAL EFFECTS;

CONTACT ANGLE; NOVOLAK RESIN; SURFACE ENERGY;

PHOTORESISTS;

EID: 0029728524     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241844     Document Type: Conference Paper

References (15)