Effects of plasma exposure on structural and optical properties of TiO2 films deposited by off-axis target sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1916-1920

  Takahashi, T ^a   Nakabayashi, H ^a   Mizuno, W ^b  

^a UNIVERSITY OF TOYAMA   (Japan)

^b TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; OPACITY; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

RAMAN SHIFT;

TITANIUM DIOXIDE;

EID: 0036863310     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1510530     Document Type: Article

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