Enhanced deposition rate of high quality stoichiometric ceramic compounds reactively sputter deposited at low pressure by modulating the discharge current at low frequency

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 916-921

  Mercs, D ^a   Lapostolle, F ^a   Perry, F ^a   Billard, A ^a   Frantz, C ^a  

^a Lab Sci Genie Surf (UMR C   (France)

Author keywords

Ceramic films; High rate deposition; Reactive sputtering; TiN TiO2

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC DISCHARGES; PRESSURE EFFECTS; SPUTTER DEPOSITION; STOICHIOMETRY; THERMAL EFFECTS; TITANIUM DIOXIDE; TITANIUM NITRIDE;

REACTIVE SPUTTERING;

CERAMIC COATINGS;

EID: 0033311625     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00262-5     Document Type: Article

References (23)

1. Okamoto A., Serikawa T. Thin Solid Films. 137:1986;143.
2. Kadlec S., Musil J., Vyskocil J. Vacuum. 37:(10):1987;729.
3. Schiller S., Heisig U., Steinfelder K., Strümpfel J. Proc. IPAT '79, London :1979;211.
4. Jones F. J. Vac. Sci. Technol. A. 6:(6):1988;3088.
5. Affinito J., Parsons R.R. J. Vac. Sci. Technol. A. 2:(3):1984;1275.
6. Billard A., Frantz C. 6th Int. Symp. on Trends and Applications of Thin Films, Regensburg, Germany :1998.
7. Hmiel A.F. J. Vac. Sci. Technol. A. 3:(3):1984;592.
8. Schiller S., Kirchhoff V., Kopte T. Proc. Conf. In situ Monitoring and Diagnostics of Plasma Processes, Gent, Belgium :1994.
9. Howson R.P., Suzuki K., Bishop C.A., Ridge M.I. Vacuum. 34:(1-2):1984;291.
10. Aronson A.J., Chen D., Class W.H. Thin Solid Films. 72:1980;535.
11. Sekigushi H., Kanzawa A., Imai T., Honda T. J. Vac. Sci. Technol. A. 12:(6):1994;3176.
12. B. Stauder, F. Perry, A. Billard, P. Pigeat, G. Henrion, C. Frantz, French Patent 92-15924, 30 December 1992; European Patent 93 403153.5, 23 December 1993; US Patent 08/172,549, 23 December 1993.
13. Lapostolle F., Loi T.H., Billard A., Frantz C. Surf. Coat. Technol. 94/95:1997;574.
14. Perry F., Billard A., Frantz C. Surf. Coat. Technol. 94/95:1997;339.
15. Perry F., Billard A., Frantz C. Surf. Coat. Technol. 94/95:1997;681.
16. Billard A., Perry F., Frantz C. Surf. Coat. Technol. 94/95:1997;345.
17. Billard A., Frantz C. J. Phys. III. 6:1996;1181.
18. Berg S., Blom H.O., Larsson T., Nender C. J. Vac. Sci. Technol. A. 5:(2):1987;202.
19. Billard A., Mercs D., Perry F., Frantz C. Surf. Coat. Tech. 116-119:1999;725.
20. A. Billard, in preparation.
21. Rossnagel S.M., Kaufman H.R. J. Vac. Sci. Technol. A. 4:(3):1986;1822.
22. Rossnagel S.M. Thin Solid Films. 171:1989;125.
23. Sanchette F., Czerwiec T., Billard A., Frantz C. Surf. Coat. Technol. 96:1997;184.