Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of β-FeSi2 optoelectronic devices

Thin Solid Films

Volumn 476, Issue 1, 2005, Pages 30-34

  Ootsuka, Teruhisa ^a   Liu, Zhengxin ^a   Osamura, Masato ^a   Fukuzawa, Yasuhiro ^a   Kuroda, Ryo ^b   Suzuki, Yasuhito ^a   Otogawa, Naotaka ^a   Mise, Takahiro ^a   Wang, Shinan ^a   Hoshino, Yasushi ^b   Nakayama, Yasuhiko ^a   Tanoue, Hisao ^a   Makita, Yunosuke ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

FeSi2; Anti reflection coating; Interface; Surface; Transparent electrode; Zinc oxide

Indexed keywords

ALUMINUM; ANTIREFLECTION COATINGS; ELECTRODES; IRON COMPOUNDS; OPTOELECTRONIC DEVICES; REFLECTION; REFRACTIVE INDEX; SPUTTERING; ZINC OXIDE;

Β-FESI2; ANTIREFLECTION; INTERFACE; SURFACE; TRANSPARENT ELECTRODE;

OPTICAL FILMS;

EID: 13844299373     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.145     Document Type: Article

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