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Volumn 289, Issue 1-2, 1996, Pages 99-106

Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties

Author keywords

Ion bombardment; Optical properties; Silicon oxide; Stress

Indexed keywords

ARGON; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL COATINGS; OPTICAL PROPERTIES; REFRACTIVE INDEX; STOICHIOMETRY; STRESSES; THIN FILMS; WEAR RESISTANCE;

EID: 0030290203     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08881-5     Document Type: Article
Times cited : (6)

References (30)
  • 12
    • 0024883445 scopus 로고
    • T. Larsson, Vacuum, 34 (1989) 949-954.
    • (1989) Vacuum , vol.34 , pp. 949-954
    • Larsson, T.1
  • 14
    • 0042324223 scopus 로고    scopus 로고
    • US Patent 4,166,784, 1979
    • C. Chapin, US Patent 4,166,784, 1979.
    • Chapin, C.1
  • 25
    • 0042324217 scopus 로고
    • Sputtering yield enhancement with arc control
    • J. Sellers, Sputtering yield enhancement with arc control, ENI Tech Note, 1993.
    • (1993) ENI Tech Note
    • Sellers, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.