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Volumn 289, Issue 1-2, 1996, Pages 99-106
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Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties
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Author keywords
Ion bombardment; Optical properties; Silicon oxide; Stress
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Indexed keywords
ARGON;
ION BOMBARDMENT;
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
OPTICAL COATINGS;
OPTICAL PROPERTIES;
REFRACTIVE INDEX;
STOICHIOMETRY;
STRESSES;
THIN FILMS;
WEAR RESISTANCE;
REACTIVE MAGNETRON SPUTTERING;
SILICON CATHODE;
SILICON OXIDE;
STRESS STOICHIOMETRY CURVE;
SILICA;
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EID: 0030290203
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)08881-5 Document Type: Article |
Times cited : (6)
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References (30)
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