Some fundamental problems of pulse biased arc ion plating

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 1-5

  Wen, L S ^a   Huang, R F ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Dust particles in plasma; Oscillations in biased arc plasma circuit; Plasma sheath; Thermodynamic nature of vapor deposition

Indexed keywords

DUST; ELECTROMAGNETIC FIELD EFFECTS; IONS; PLASMA SHEATHS; PROBLEM SOLVING;

ELECTROMAGNETIC ANALYSIS; LOW TEMPERATURE PLASMAS; PBAIP CIRCUITS; PULSE BIASED ARC ION PLATING (PBAIP);

COATING TECHNIQUES;

VAPOR DEPOSITION;

EID: 13844276682     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.123     Document Type: Article

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