Growth of biaxially textured Ba xPb 1-xTiO 3 ferroelectric thin films on amorphous Si 3N 4

Journal of Applied Physics

Volumn 97, Issue 3, 2005, Pages

  Brewer, Rhett T ^a   Boyd, David A ^a   El Naggar, Mohamed Y ^a   Boland, Stacey W ^a   Park, Young Bae ^a   Haile, Sossina M ^a   Goodwin, David G ^a   Atwater, Harry A ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CHAMBERS; DYNAMIC CONTACT MODE ELECTROSTATIC FORCE MICROSCOPY (DC-EFM); FULL WIDTH AT HALF MAXIMUM (FWHM); REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION (RHEED);

AMORPHOUS SILICON; BARIUM COMPOUNDS; FERROELECTRIC MATERIALS; GRAIN BOUNDARIES; HIGH ENERGY ELECTRON DIFFRACTION; ION BEAM ASSISTED DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; MOLECULAR BEAM EPITAXY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOL-GELS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

THIN FILMS;

EID: 13644282496     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1806994     Document Type: Article

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