Focused ion beam induced metalorganic chemical vapor deposition of C-Pt thin film

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 25, Issue 11, 2004, Pages 1458-1463

  Jiang, Suhua ^a   Tang, Ling ^a   Wang, Jiaji ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Carbon; Focused ion beam; MOCVD; Platinum; Thin film

Indexed keywords

COMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLATINUM; THIN FILMS;

CARBON PLATINUM FILM; DEPOSITION RATE; FOCUSED ION BEAMS;

ION BEAMS;

EID: 13644271797     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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