Investigation on etch performance of focused ion beam

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 22, Issue 2, 2001, Pages 151-155

  Xie, J ^a   Jiang, S H ^a   Wang, J J ^a   Tang, L J ^a   Zong, X F ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Etching; Focused ion beam; Integrated circuit; Sputtering

Indexed keywords

BINDING ENERGY; INTEGRATED CIRCUITS; REACTIVE ION ETCHING; SPUTTERING;

ATOMIC BINDING ENERGY; FOCUSED ION BEAM;

ION BEAMS;

EID: 0035261742     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)