Investigation on properties of Focused Ion Beam Enhanced Etching

2001 6th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2001 - Proceedings

Volumn 2, Issue , 2001, Pages 1091-1094

  Jiang, Suhua ^a   Ni, Jingfeng ^a   Wang, Jiaji ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Enhanced Etching; Focused Ion Beam; Sputtering

Indexed keywords

EID: 84964539500     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSICT.2001.982088     Document Type: Conference Paper

References (4)

1. Alain. c. Diebold, J. Vac. Sci. Technol, B, Vol. 12, No. 4 Jul/Aug, 1994, 2768
2. Kenji Gamo & Susumu Namba, J. Vac. Sci. Technol. B, Vol. 8, No. 8, Nov/Dec, 1990,1927
3. Peter Carleson, Focused Ion Beam Basics, FEI Company
4. Xie Jin, Jiang Suhua, Chinese Journal of Semiconductors, Vol. 22, No. 2, Feb., 2001, 151