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Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 102-108

Stability analysis of reactive sputtering process with variable sticking coefficients

(2) Li, Chuan a Hsieh, Jang Hsing a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Hysteresis; Langmuir kinetics; Reactive sputtering; Stability; Sticking coefficient

Indexed keywords

HYSTERESIS; LANGMUIR BLODGETT FILMS; MATHEMATICAL MODELS; PHASE TRANSITIONS; PROCESS CONTROL; STABILITY;

LANGMUIR KINETICS; REACTIVE GAS; REACTIVE SPUTTERING; STICKING COEFFICIENT;

SPUTTERING;

EID: 13444301427 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.08.050 Document Type: Conference Paper

Times cited : (5)

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