Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 221-224

  Muta, M ^a   Ohgushi, S ^a   Matsuda, Y ^a   Fujiyama, H ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; CATHODES; ELECTRIC EXCITATION; EMISSION SPECTROSCOPY; FLUORESCENCE; GROUND STATE; INDIUM; MAGNETRON SPUTTERING; OXYGEN; PARTIAL PRESSURE; PLASMAS;

DIRECT CURRENT REACTIVE MAGNETRON SPUTTERING; INDIUM TIN OXIDE; PLASMA PARAMETERS; TWO DIMENSIONAL LASER INDUCED FLUORESCENCE; TWO DIMENSIONAL OPTICAL EMISSION SPECTROSCOPY; TWO DIMENSIONAL SPATIAL PROFILES;

INDIUM COMPOUNDS;

EID: 0032658722     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01528-4     Document Type: Article

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