Collision processes between sputtered particles on high speed rotating substrate and atomic mass dependence of sticking coefficient

Journal of Crystal Growth

Volumn 237-239, Issue 1-4 III, 2002, Pages 2041-2045

  Obara, Kozo ^a   Fu, Zixun ^a   Arima, Masahiro ^a   Yamada, Takeshi ^a   Fujikawa, Takashi ^a   Imamura, Nariaki ^a   Terada, Norio ^a  

^a KAGOSHIMA UNIVERSITY   (Japan)

Author keywords

A1. Surface processes; A2. Growth from vapor; A3. Physical vapor deposition processes

Indexed keywords

ARGON; PHYSICAL VAPOR DEPOSITION; PLASMA COLLISION PROCESSES; SPUTTER DEPOSITION; SURFACE REACTIONS; THIN FILMS;

STICKING COEFFICIENT;

VAPOR PHASE EPITAXY;

EID: 0036531472     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)02306-5     Document Type: Article

References (7)