In situ characterization of III-V substrate oxide desorption by surface photoabsorption in MOVPE

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 66, Issue 1, 1999, Pages 83-87

  Allwood, D A ^a   Mason, N J ^a   Walker, P J ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; HEAT TREATMENT; LIGHT ABSORPTION; LIGHT REFLECTION; METALLORGANIC VAPOR PHASE EPITAXY; OXIDATION; OXIDES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR GROWTH; THERMAL EFFECTS;

GALLIUM ANTIMONIDE; INDIUM ANTIMONIDE; SURFACE PHOTOABSORPTION (SPA);

SUBSTRATES;

EID: 0033284094     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00129-4     Document Type: Article

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