Deposition of SiO2 films by low-energy ion-beam induced chemical vapor deposition using hexamethyldisiloxane

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 365-368

  Matsutani, Takaomi ^a   Asanuma, Tatsuya ^a   Liu, Chang ^a   Kiuchi, Masato ^a   Takeuchi, Takae ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NARA WOMEN'S UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Hexamethyldisiloxane; Ion beam; Silicon dioxide film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; SILICA; SURFACE ROUGHNESS;

BUBBLING SYSTEMS; ION BEAM ITCHING;

THIN FILMS;

COATING;

EID: 1342311280     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.09.028     Document Type: Article

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