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Applied Physics A: Materials Science and Processing

Volumn 66, Issue 6, 1998, Pages 663-668

Ion beam smoothing of indium-containing III-V compound semiconductors

(3) Frost, F a Schindler, A a Bigl, F a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; MORPHOLOGY; SEMICONDUCTING INDIUM COMPOUNDS; SURFACE ROUGHNESS;

ANGLE OF INCIDENCE; ION BEAM SMOOTHING;

REACTIVE ION ETCHING;

EID: 0032098109 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050730 Document Type: Article

Times cited : (36)

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