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Volumn 60, Issue 4-5, 2001, Pages 545-549

Nanometer-scale voids in PECVD silicon-oxide films probed by variable-energy positron lifetime spectroscopy: A comparison with infrared spectroscopy

Author keywords

Free volume voids; PECVD silicon oxide films; Slow positrons

Indexed keywords

INFRARED SPECTROSCOPY; MONOMERS; PLASMA DEVICES; POSITRONS;

EID: 0035088454     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(00)00400-X     Document Type: Conference Paper
Times cited : (6)

References (16)
  • 2
    • 0032790931 scopus 로고    scopus 로고
    • Post-deposition aging reactions differ markedly between plasma polymers deposited from siloxane and silazane monomers
    • (1999) Polymer , vol.40 , pp. 5079
    • Gengenbach, T.R.1    Griesser, H.J.2
  • 6
    • 0000778033 scopus 로고
    • Quantitative analysis of the effect of disorder-induced mode coupling on infrared absorption in silica
    • (1988) Phys. Rev. B , vol.38 , pp. 1255
    • Kirk, C.T.1
  • 7
    • 0000767388 scopus 로고
    • Critical investigation of the infrared-transmission-data analysis of hydrogenated amorphous silicon alloys
    • (1992) Phys. Rev. B , vol.46 , pp. 2078
    • Maley, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.