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Volumn 60, Issue 4-5, 2001, Pages 545-549
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Nanometer-scale voids in PECVD silicon-oxide films probed by variable-energy positron lifetime spectroscopy: A comparison with infrared spectroscopy
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Author keywords
Free volume voids; PECVD silicon oxide films; Slow positrons
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Indexed keywords
INFRARED SPECTROSCOPY;
MONOMERS;
PLASMA DEVICES;
POSITRONS;
OXYGEN PRESSURES;
SILICON COMPOUNDS;
OXIDE;
SILICON;
SILOXANE;
CHEMICAL INTERACTION;
CONFERENCE PAPER;
FILM;
INFRARED SPECTROSCOPY;
INTERMETHOD COMPARISON;
LIFESPAN;
OXYGEN TENSION;
POSITRON;
POSITRONIUM;
STRUCTURE ANALYSIS;
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EID: 0035088454
PISSN: 0969806X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0969-806X(00)00400-X Document Type: Conference Paper |
Times cited : (6)
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References (16)
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