Hydrogen bonding and void microstructure of a-Ge:H films

Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4453-4455

  Mulato, M ^a   Chambouleyron, I ^a   Torriani, I L ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1342278903     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361756     Document Type: Article

References (17)

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