Dry processing of thin film capacitors arrays using ion beam assisted deposition

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 388-391

  Ide Ektessabi, Ari ^a   Uehara, Hiroki ^a   Kamitani, Susumu ^b  

^a KYOTO UNIVERSITY   (Japan)

^b Sanwa Kenma Ltd   (Japan)

Author keywords

Aluminum oxide; Atomic force microscopy; Ion beam assisted deposition; Rutherford backscattering spectroscopy; Thin film capacitor; X Ray diffraction

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CAPACITANCE MEASUREMENT; CAPACITORS; COPPER; CRYSTAL STRUCTURE; DIELECTRIC FILMS; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM OXIDE; NANO-MORPHOLOGY; THIN FILM CAPACITORS;

THIN FILM DEVICES;

EID: 1342302437     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01079-4     Document Type: Conference Paper

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