Treatment homogeneity and conformal analysis of plasma based ion implanted 3D target

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 217, Issue 2, 2004, Pages 300-306

  Sun, Qi ^a   Gu, Changxin ^a   Ma, Xinxin ^b   Xia, Lifang ^b  

^a FUDAN UNIVERSITY   (China)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Conformal implantation; Plasma based ion implantation; Treatment homogeneity

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; ION BOMBARDMENT; NITROGEN; PLASMA DENSITY; SILICON WAFERS; SPUTTERING; SURFACE TREATMENT;

CONFORMAL IMPLANTATION; PLASMA BASED ION IMPLANTATION; TREATMENT HOMOGENEITY;

ION IMPLANTATION;

EID: 1342287129     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2003.11.006     Document Type: Article

References (23)

1. Wang W., Booske J.H., Baum C., Clothier C., Zjaba N., Zhang L. Surf. Coat. Technol. 111:1999;97.
2. Mändl S., Günzel R., Rauschenbach B., Hilke R., Knösel E., Künanz K. Surf. Coat. Technol. 103-104:1998;161.
3. Coeur F.L., Pelletier J., Arnal Y., Lacoste A. Surf. Coat. Technol. 125:2000;71.
4. Davis H.A., Wood B.P., Munson C.P., Bitteker L.J., Nastasi M.A., Rej D.J., Waganaar W.J., Walter K.C., Coates D.M., Schleinitz H.M. Material. Chem. Phys. 54:1998;213.
5. Yang B.L., Jones E.C., Cheung N.W., Shao J., Wong H., Cheng Y.C. Surf. Coat. Technol. 38:1998;1489.
6. Shao J., Jones E.C., Cheung N.W. Surf. Coat. Technol. 93:1997;254.
7. Han S., Lee Y., Kim H., Kim G., Lee J., Yoon J.H., Kim G. Surf. Coat. Technol. 93:1997;261.
8. Chen A., Scheuer J.T., Ritter C., Alexander R.B., Conrad J.R. J. Appl. Phys. 70:1991;6757.
9. Conrad J.R., Baumann D., Fleming R., Meeker G.P. J. Appl. Phys. 65(4):1989;1707.
10. Ensinger W., Höchbauer T., Rauschenbach B. Surf. Coat. Technol. 103-104:1998;218.
11. Malik S.M., Muller D.E., Sridharan K., Fetherston R.P., Tran N. J. Appl. Phys. 77:1995;1.
12. Sheridan T.E. J. Appl. Phys. 81:1997;7153.
13. Mändl S., Barradas N.P., Brutscher J., Günzel R., Möller W. Nucl. Instr. and Meth. B. 127-128:1997;996.
14. Mändle S., Reuther H., Brutscher J., Günzel R., Möller W. Surf. Coat. Technol. 93:1997;229.
15. Hong M.P., Emmert G.A. J. Appl. Phys. 78:1995;6967.
16. Ensinger W., Volz K., Höchbauer T. Surf. Coat. Technol. 128-129:2000;265.
17. Ensinger W., Volz K. Nucl. Instr. and Meth. B. 166-167:2000;154.
18. Sun Q., Ma X.X., Xia L.F. Nucl. Instr. and Meth. B. 170:2000;397.
19. Sun Q., Ma X.X., Xia L.F. J. Phys. D: Appl. Phys. 33:2000;2647.
20. Malik S.M., Fetherston R.P., Sridharan K., Conrad J.R. Plasma Sources Sci. Technol. 2:1993;81.
21. Ensinger W., Höchbauer T., Rauschenbach B. Surf. Coat. Technol. 103-104:1998;218.
22. Sun Q., Xia L.F., Ma X.X., Sun M.R. Appl. Surf. Sci. 206:2003;53.
23. Sun Q., Ma X.X., Xia L.F., Sun M.R. Modelling and Simulation in Materials Science and Engineering. 11:2003;1.