Investigation of the RF plasma jet system for deposition of LiCoOx thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 632-637

  Hubicka Z ^a   Cada M ^a   Jakubec, I ^b   Bludska J ^b   Malkova Z ^a   Trunda, B ^a   Ptacek P ^a   Pridal J ^a   Jastrabk L ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

Langmuir probe; LiCoO2 thin films; Plasma jet; RF hollow cathode

Indexed keywords

CYCLIC VOLTAMMETRY; ELECTRON MICROSCOPY; HIGH TEMPERATURE EFFECTS; LITHIUM COMPOUNDS; SPUTTER DEPOSITION; THIN FILMS;

DISTRIBUTION FUNCTIONS; ELECTRON ENERGY;

PLASMA JETS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144453890     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00583-8     Document Type: Article

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