Methyl-terminated Si(1 1 1) surface as the ultra thin protection layer to fabricate position-controlled alkyl SAMs by using atomic force microscope anodic oxidation

Surface Science

Volumn 552, Issue 1-3, 2004, Pages 46-52

  Okada, R ^a   Miyadera, T ^a   Shimada, T ^a   Koma, A ^a   Ueno, K ^b   Saiki, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Auger electron spectroscopy; Etching; Reflection high energy electron diffraction (RHEED); Self assembly; Silicon; Surface chemical reaction

Indexed keywords

ANNEALING; ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; CRYSTAL ORIENTATION; ELECTROLYSIS; SILICON; ULTRATHIN FILMS;

ORGANIC MOLECULES; SILICON MICROCIRCUITS;

SELF ASSEMBLY;

EID: 1342264254     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.01.026     Document Type: Article

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