Ultraviolet photoelectron spectroscopy of a methyl-terminated Si(1 1 1) surface

Surface Science

Volumn 526, Issue 1-2, 2003, Pages 177-183

  Miyadera, Tetsuhiko ^a   Koma, Atsushi ^a   Shimada, Toshihiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Alkanes; Angle resolved photoemission; Auger electron spectroscopy; Chemisorption; Electrochemical methods; Reflection high energy electron diffraction (RHEED); Silicon; Visible and ultraviolet photoelectron spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BAND STRUCTURE; CHEMISORPTION; ELECTROCHEMISTRY; HYDROGEN; MORPHOLOGY; PARAFFINS; PHOTOELECTRON SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

METHYLATION;

SILICON;

EID: 0037456199     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)02648-1     Document Type: Article

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