Investigations of the Ga+ focused-ion-beam implantation in resist films for nanometer lithography applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3016-3020

  Arshak, Khalil ^a   Mihov, Miroslav ^a   Nakahara, Shohei ^a   Arshak, Arous ^a   McDonagh, Declan ^b  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b Toumaz Technology Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRON MICROSCOPES; FAILURE ANALYSIS; GALLIUM; GALLIUM COMPOUNDS; INTEGRATED CIRCUIT MANUFACTURE; ION BEAM LITHOGRAPHY; ION BEAMS; PHOTORESISTS; POLYMETHYL METHACRYLATES; POSITIVE IONS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ION-BEAM-INHIBITED ETCHING (IBIE); NANOMETER LITHOGRAPHY; NEGATIVE-RESIST-IMAGE-BY-DRY-ETCHING (NERIME); RESIST FILMS;

ION IMPLANTATION;

EID: 13244295834     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1813451     Document Type: Conference Paper

References (11)

1. R. Gerlach and M. Utlaut, Proc. SPIE 4510, 96 (2001).
2. K. Gamo, Microelectron. Eng. 32, 159 (1996).
3. H. Morimoto, Y. Sasaki, K. Saitoh, Y. Watakabe, and T. Kato, Microelectron. Eng. 4, 163 (1986).
4. H. Kuwano, J. Appl. Phys. 55, 1149 (1984).
5. I. Adesida, Nucl. Instrum. Methods Phys. Res. 209-210, 79 (1983).
6. J. Zachariasse and J. Walker, Microelectron. Eng. 35, 63 (1997).
7. J. Melngailis, J. Vac. Sci. Technol. B 5, 469 (1987).
8. K. Arshak, M. Mihov, D. Sutton, A. Arshak, and S. B. Newcomb, Microelectron. Eng. 67-68, 130 (2003).
9. K. Arshak, M. Mihov, A. Arshak, D. McDonagh, D. Sutton, and S. B. Newcomb, J. Vac. Sci. Technol. B 22, 189 (2004).
10. K. Arshak, M. Mihov, A. Arshak, D. McDonagh, D. Sutton, S. Newcomb, and T. J. Kinsella, Proc. SPIE Opto Ireland 2002 4876, 525 (2003).
11. K. Arshak, M. Mihov, A. Arshak, D. McDonagh, and D. Sutton, Proc. 13 Int. Conf. on Photopolymers IBM RETEC 2003, 46 (2003).