Scanning-spatial-phase alignment for zone-plate-array lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3382-3385

  Menon, Rajesh ^a,b   Moon, Euclid E ^a   Mondol, Mark K ^a   Castaño, Fernando J ^a   Smith, Henry I ^a  

^a USA   (United States)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

SCANNING-ELECTRON-BEAM LITHOGRAPHY (SEBL); SCANNING-SPATIAL-PHASE ALIGNMENT; ZONE-PLATE-ARRAY LITHOGRAPHY (ZPAL); ZONE-PLATE-ARRAY MICROSCOPY (ZPAM);

ABERRATIONS; CAMERAS; CHARGE COUPLED DEVICES; COMPUTER SOFTWARE; IMAGING SYSTEMS; LIGHT MODULATORS; MICROSCOPES; MICROSCOPIC EXAMINATION; ULTRAVIOLET RADIATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 13244283404     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1809631     Document Type: Conference Paper

References (15)

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13. The sample was provided by Dr. Don Yansen.
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