Novel strategy for the design of highly transparent ArF resists with excellent dry etch resistance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 53-61

  Zhao, Wenwei ^a   Ohfuji, Takeshi ^b   Sasago, Masaru ^b   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; COPOLYMERIZATION; COPOLYMERS; CURING; CYANIDES; CYCLIZATION; ESTERS; GRAFTING (CHEMICAL); HEAT TREATMENT; PHOTORESISTORS; PHOTORESISTS; POLYACRYLATES; POLYMERS; SYNTHESIS (CHEMICAL); TRANSPARENCY;

ARF LITHOGRAPHIES; ARF RESISTS; BUTYL ESTERS; BUTYL METHACRYLATES; CHEMICALLY AMPLIFIED RESISTS; CYCLIZATION REACTIONS; DE COUPLINGS; DRY-ETCH; ELECTROPHILIC REAGENTS; HIGH TRANSPARENCIES; INTRAMOLECULAR CYCLIZATION; METHACRYLIC ACIDS; NEW STRATEGIES; NITRILE GROUPS; NOVEL STRATEGIES; POLY(HYDROXYSTYRENE); POST-EXPOSURE BAKES; RESIST MATRIXES; RIGID RINGS; SINGLE LAYERS; THERMAL TREATMENTS;

ACID RESISTANCE;

EID: 13244263776     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312448     Document Type: Conference Paper

References (19)

1. Kaimoto, Y.; Nozaki, K.; Takechi, S.; Abe, N. Proc. SPIE 1992, 1672, 66-73.
2. Wallraff, G.M.; Allen, R. D.; Hinsberg, W. D.; Larson, C. F.; Johnson, R. D.; DiPietro, R.; Breyta, G.; Hacker, N. J. Vac. Sci. Technol. 1993, B11, 2783-2788.
3. Nozaki, K.; Kaimoto, Y.; Takahashi, M.; Takechi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
4. Takahashi, M.; Takechi, S.; Hanyu, I.; Abe, N. Proc. SPIE 1995, 2438, 422-432.
5. Allen, R. D.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1994, 7, 507.
6. Nozaki, K.; Watanabe, K.; Namiki, T.; Igarashi, M.; Kuramitsu, Y.; Yano, E. Jpn. J. Appl. Phys. 1996, 35, L528-530.
7. Nakano, K.; Maeda, K.; Iwasa, S.; Yano, J.; Ogura, Y.; Hasegawa, E. Proc. SPIE 1994, 2195, 194-204.
8. Maeda, K.; Nakano, K.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1996, 2724, 377-385.
9. (a) Wallow, T. I.; Houlihan, F. M.; Nalamasu, O.; Chandross, E. D.; Neenan, T. X.; Reichmanis, E. Proc. SPIE 1996, 2724, 355-364.
10. (b) Houlihan, F. M.; Wallow, T. I.; Nalamasu, O.; Reichmanis, E. Macromolecule 1997, 30, 6517-6524.
11. Allen, R. D.; Sooriyakumaran, R.; Optiz, J.; Wallraff, G. M.; DiPietro, R.; Breyta, G.; Hofer, D. C.; Kunz, R. R.; Okoroanyanwu, U.; Willson, C. G. Proc. SPIE 1996, 2724, 334-343.
12. Gokar, H.; Esho, S.; Ohnishi, Y. J. Electrochem. Soc. 1983, 130, 143-146.
13. Abe, N.; Takechi, S.; Kaimoto, Y.; Takeshi, S.; Nozaki, K. J. Photopolym. Sci. Technol. 1995, 8, 637-642
14. Kunz, R. R.; Palmateer, S. C.; Forte, A. R.; Allen, R. D.; Wallraff, O. M.; DiPietro, R. A.; Hofer, D. C. Proc. SPIE 1996, 2724, 365-376.
15. Bashir, B. Carbon 1991, 29, 1081-1090, and references therein.
16. Grassie, N.; Hay, J. N. J. Polym. Sci. 1962, 56, 189-202.
17. Grassie, N.; McGuchan, R. Eur. Polym. J. 1972, 8, 257-269; 865-878.
18. Watt, W.; Johnson, W. Nature 1975, 257, 210-212.
19. See for example, Reichmanis, E.; Galvin, M. E.; Uhrich, K. E.; Mirau, P.; Heffner, S. A. in Polymeric Materials for Microelectronic Applications, Science and Technology, Ito, H.; Tagawa, S.; Horie, K.; Eds, Washington DC, 1994, pp53-69.