New single-layer resist for 193-nm lithography

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 4 B, 1996, Pages

  Nozaki, Koji ^a   Watanabe, Keiji ^a   Namiki, Takahisa ^a   Igarashi, Miwa ^a   Kuramitsu, Yoko ^a   Yano, Ei ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; COPOLYMERS; EXCIMER LASERS; MOLECULAR STRUCTURE; ORGANIC POLYMERS; PHOTORESISTS; ULTRAVIOLET SPECTROSCOPY;

CHEMICAL AMPLIFIED RESIST; METHACRYLATE POLYMER; METHYL ADAMANTANOL; MEVALONIC LACTONE; PROTECTIVE GROUP; SINGLE LAYER RESIST;

LITHOGRAPHY;

EID: 0030124667     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l528     Document Type: Article

References (12)