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Volumn 812, Issue , 2004, Pages 103-108

Modification of nanoporous silica structures by fluorocarbon plasma treatment

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FLUOROCARBONS; HYDROGEN; METALLIZING; MORPHOLOGY; PERMITTIVITY; PLASMAS; POLYMERIZATION; POLYMERS; POROUS MATERIALS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SURFACES;

EID: 12844273495     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-812-f6.7     Document Type: Conference Paper
Times cited : (2)

References (12)
  • 11
    • 0034187895 scopus 로고    scopus 로고
    • Determination of pore size distribution in thin films by ellipsometeric porosimetry
    • M. R. Baklanov, K. P. Moginikov, V. G. Polovinkin, F. N. Dultsev, "Determination of pore size distribution in thin films by ellipsometeric porosimetry", J. Vac. Sci. Technol. B, 18(3), 1385 (2000).
    • (2000) J. Vac. Sci. Technol. B , vol.18 , Issue.3 , pp. 1385
    • Baklanov, M.R.1    Moginikov, K.P.2    Polovinkin, V.G.3    Dultsev, F.N.4
  • 12
    • 0036776712 scopus 로고    scopus 로고
    • Non-destructive characterization of porous low-k dielectric films
    • M. R. Baklanov, K. P. Mogilnikov, "Non-destructive characterization of porous low-k dielectric films", Microelectronic Engineering, 64, 335 (2002).
    • (2002) Microelectronic Engineering , vol.64 , pp. 335
    • Baklanov, M.R.1    Mogilnikov, K.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.