Comparison of phase diagrams for vhf and if plasma-enhanced chemical vapor deposition of Si:H films

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 215-220

  Ferreira, G M ^a   Ferlauto, A S ^a   Pearce, J M ^a   Wronski, C R ^a   Ross, C ^b   Collins, R W ^c  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c UNIVERSITY OF TOLEDO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; ELLIPSOMETRY; HYDROGENATION; MICROSTRUCTURE; PHASE DIAGRAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS;

ELECTRONIC QUALITY; PLASMA EXCITATION; REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE); VERY HIGH FREQUENCY (VHF);

SILICON;

EID: 12744276060     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. A. Shah, J. Meier, E. Vallat-Sauvain, C. Droz, U. Kroll, N. Wyrsch, J. Guillet, and U. Graf, Thin Solid Films 403, 179 (2002).
2. th IEEE Photovoltaic Specialists Conference, (IEEE, 1997) p. 591.
3. M. Tzolov, F. Finger, R. Carius, and P. Hapke, J. Appl. Phys. 81, 7376 (1997).
4. M. Fukawa, S. Suzuki, L. Guo, M. Kondo, A. Matsuda, Sol. Energy Mater. Sol. Cells 66, 217 (2001).
5. R. W. Collins, A.S. Ferlauto, G.M. Ferreira, C. Chen, J. Koh, R.J. Koval, Y. Lee, J.M. Pearce, and C.R. Wronski, Sol. Energy Mater. Sol. Cells 78, 143 (2003).
6. Y. Lu, S. Kim, M. Gunes, Y. Lee, C. R. Wronski, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 336 (1994) 595.
7. O. Vetterl, F. Finger, R. Carius, P. Hapke, L. Houben, O. Kluth, A. Lambertz, A. Muck, B. Rech, and H. Wagner, Sol. Energy Mater. Sol. Cells 62, 97 (2000).
8. A. Matsuda, J. Vac. Sci. Technol. A 16, 365 (1998).
9. For recent results see: D.C. Marra, W.M.M. Kessels, M.C.M. van de Sanden, K. Kashefizadeh, E.S. Aydil, Surf. Sci. 530, 1 (2003).