SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 425-430

Protocrystalline silicon at high rate from undiluted silane

(5) Schropp, R E I a Van Veen, M K a Van Der Werf, C H M a Williamson, D L b Mahan, A H c

a UTRECHT UNIVERSITY (Netherlands)

b Department of Metallurgical and Materials Engineering (United States)

c NATIONAL RENEWABLE ENERGY LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

FIRST SHARP PEAK (FSP); HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); PROTOCRYSTALLINE SILICON; SMALL ANGLE X-RAY SCATTERING (SAXS);

SILANES;

EID: 12744267771 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-808-a8.4 Document Type: Conference Paper

Times cited : (31)

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