Single phosphorus ion implantation into prefabricated nanometre cells of silicon devices for quantum bit fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4124-4128

  Yang, Changyi ^a   Jamieson, David N ^a   Pakes, Chris ^a   Prawer, Steven ^a   Dzurak, Andrew ^b   Stanley, Fay ^b   Spizziri, Paul ^a   Macks, Linda ^b   Gauja, Eric ^b   Clark, Robert G ^b  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

KeV single ion detection; Qubit; Single ion implantation

Indexed keywords

ELECTRIC RESISTANCE; ELECTRODES; ION IMPLANTATION; SEMICONDUCTING SILICON; SOLID STATE DEVICES;

QUANTUM BITS;

QUANTUM ELECTRONICS;

EID: 12444280119     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4124     Document Type: Conference Paper

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