Anisotropic crystallite size analysis of textured nanocrystalline silicon thin films probed by X-ray diffraction

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 216-221

  Morales, M ^a   Leconte, Y ^a   Rizk, R ^a   Chateigner, D ^b  

^a LERMAT Laboratoire d'Etude et de Recherche sur les Materiaux   (France)

^b UNIVERSITÉ DE CAEN   (France)

Author keywords

Anisotropy; Silicon; Sputtering; Texture analysis; X Ray diffraction

Indexed keywords

ADSORPTION; ANISOTROPY; COMPUTER SIMULATION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; DEPOSITION; GONIOMETERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBABILITY; SILICON COMPOUNDS; SINGLE CRYSTALS; SPUTTERING; STATISTICAL METHODS; SYNCHROTRONS; THICKNESS MEASUREMENT; X RAY DIFFRACTION;

CRYSTALLITE SIZE; TEXTURE ANALYSIS;

THIN FILMS;

EID: 1242332987     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.074     Document Type: Conference Paper

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