Direct patterning of polymer-based photo luminescent structures with a mask

Thin Solid Films

Volumn 450, Issue 2, 2004, Pages 329-333

  Peng, Juan ^a   Han, Yanchun ^a   Yang, Yuming ^a   Li, Binyao ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

Atomic force microscopy; Optical properties; Patterning; Thin polymer film

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; ELECTRIC POTENTIAL; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; PERMITTIVITY; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE; POLYMETHYL METHACRYLATES; SURFACE TENSION; THIN FILMS;

PATTERNING; PHOTO LUMINESCENT STRUCTURES; THIN POLYMER FILMS;

MASKS;

EID: 1242298501     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.042     Document Type: Article

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