Surface damage induced by focused-ion-beam milling in a Si/Si p-n junction cross-sectional specimen

Applied Surface Science

Volumn 241, Issue 1-2 SPEC. ISS., 2005, Pages 80-86

  Wang, Zhouguang ^a   Kato, Takeharu ^a   Hirayama, Tsukasa ^a   Kato, Naoko ^b   Sasaki, Katsuhiro ^c   Saka, Hiroyasu ^c  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b International Test and Engineering Services Co Ltd   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

Damage effect; FIB; Sample preparation; TEM

Indexed keywords

CHARACTERIZATION; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; ION BEAMS; MICROANALYSIS; SHRINKAGE; SURFACE PHENOMENA; TRANSMISSION ELECTRON MICROSCOPY;

DAMAGE EFFECTS; FOCUSED-ION-BEAM (FIB); SAMPLE PREPARATION; SURFACE DAMAGE;

COMMINUTION;

EID: 12344265097     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.09.092     Document Type: Conference Paper

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