Elemental distribution in fluorinated amorphous carbon thin films

Journal of the American Society for Mass Spectrometry

Volumn 16, Issue 1, 2005, Pages 126-131

  Lamperti, A ^a   Bottani, C E ^a   Ossi, P M ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILM SURFACE; FOCUSED ION BEAM-SECONDARY ION MASS SPECTROMETRY (FIB-SIMS); ION DISTRIBUTION; ION IMAGING; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD); SPATIAL RESOLUTION;

AMORPHOUS MATERIALS; CARBON; CHEMICAL VAPOR DEPOSITION; HYDROGEN; INFRARED SPECTROSCOPY; ION BEAMS; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY;

THIN FILMS;

CARBON; DIAMOND; FLUORINE; HYDROGEN; ION; POLYMER;

ARTICLE; CHEMICAL ANALYSIS; CORRELATION ANALYSIS; FILM; FLUORINATION; HARDNESS; IMAGE ANALYSIS; IMAGING; INFRARED SPECTROSCOPY; MASS SPECTROMETRY; PLASMA; RAMAN SPECTROMETRY; SPECTROSCOPY; STRUCTURE ANALYSIS; SUBSTITUTION REACTION; SURFACE PROPERTY; VAPOR; VIBRATION;

CARBON; FLUORINE; MICROCHEMISTRY; NANOTECHNOLOGY; SPECTROMETRY, MASS, SECONDARY ION; SURFACE PROPERTIES;

EID: 11844298969     PISSN: 10440305     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jasms.2004.09.022     Document Type: Article

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