Photomask in-plane distortion induced during e-beam patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 275-279

  Shamoun, Bassam ^a   Sprague, Michael ^a   Engelstad, Roxann ^a   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

E beam patterning; In plane distortions; Photomask

Indexed keywords

DEGREES OF FREEDOM (MECHANICS); FINITE ELEMENT METHOD; HEAT TRANSFER; MASKS; MONTE CARLO METHODS;

ELECTRON-BEAM PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0032402745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309581     Document Type: Conference Paper

References (7)

1. Image placement errors in x-ray masks induced by change in resist stress during electron-beam writing
2. Heating and temperature-induced distortions of silicon x-ray masks
3. E-beam induced distortions on SiN x-ray mask membrane
4. Resist heating effects in 25 and 50 kV E-beam lithography on glass masks
5. Measurement of resist heating in photomask fabrication