Assessment of optical coatings for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 470-479

  Liberman, Vladimir ^a   Rothschild, Mordechai ^a   Sedlacek, Jan H C ^a   Uttaro, Ray S ^a   Grenville, Andrew ^b   Bates, Allen K ^a,c   Van Peski, Chris K ^a,d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c IBM   (United States)

^d SEMATECH   (United States)

Author keywords

193 nm lithography; Absorption; Antireflective coatings; Laser induced damage

Indexed keywords

193-NM LITHOGRAPHY; ABSORPTION MEASUREMENTS; ANTIREFLECTIVE COATINGS; CATASTROPHIC DAMAGE; IN-SITU; LASER-INDUCED DAMAGE; TRANSMISSION MEASUREMENTS;

ABSORPTION; LASER DAMAGE; LITHOGRAPHY; OPTICAL COATINGS;

COATINGS;

EID: 33645613353     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310775     Document Type: Conference Paper

References (8)

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