SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 101-104

Optical characterization of indium-tin-oxynitride fabricated by RF-sputtering

(7) Aperathitis, E a Modreanu, M b Bender, M c Cimalla, V d Ecke, G d Androulidaki, M a Pelekanos, N a

a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER (Greece)

b UNIVERSITY COLLEGE CORK (Ireland)

c Applied Films GmbH and Co KG (Germany)

d ILMENAU UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Conductivity; Indium tin oxide; Nitrides; Optical properties; Sputtering; Structural properties

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT TRANSMISSION; NITRIDES; OPTICAL SYSTEMS; SPUTTERING; THIN FILMS;

INDIUM TIN OXIDE; STRUCTURAL PROPERTIES;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 1142267510 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2003.10.046 Document Type: Conference Paper

Times cited : (14)

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